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Course6.77421 lectures

Physics of Microfabrication: Front End Processing

Prof. Judy Hoyt and Prof. L. Rafael Reif · Massachusetts Institute of Technology

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About

This course is offered to graduates and focuses on understanding the fundamental principles of the “front-end” processes used in the fabrication of devices for silicon integrated circuits. This includes advanced physical models and practical aspects of major processes, such as oxidation, diffusion, ion implantation, and epitaxy. Other topics covered include: high performance MOS and bipolar devices including ultra-thin gate oxides, implant-damage enhanced diffusion, advanced metrology, and new materials such as Silicon Germanium (SiGe).

Lectures

Audio Lectures

  1. 3. Crystal Growth, Wafer Fabrication, and Basic Properties of Si Wafers (cont.) Video
  2. 4. Wafer Cleaning and Gettering (cont.) Video
  3. 5. Wafer Cleaning and Gettering - Contamination Measurement Techniques Video
  4. 6. Oxidation and the Si/SiO2 Interface. Deal/Grove Model, Thin Oxide Models Video
  5. 7. Oxidation and the Si/SiO2 Interface. 2D Effects, Doping Effects, Point Defect Video
  6. 8. Dopant Diffusion - Need for Abrupt Profiles, Fick's Laws, Simple Analytic Video
  7. 9. Dopant Diffusion - Numerical Techniques in Diffusion, E Field Effects Video
  8. 10. Dopant Diffusion - Fermi Level Effects, I and V Assisted Diffusion Video
  9. 11. Dopant Diffusion - Review Atomic Scale Models, Profile Measurement Techniques Video
  10. 12. Ion Implantation and Annealing - Analytic Models and Monte Carlo Video
  11. 13. Ion Implantation and Annealing - Physics of E Loss, Damage, Introduction to TED Video
  12. 14. Transient Enhanced Diffusion (TED) - +1 Model, (311) Defects and TED Introduction Video
  13. 15. Transient Enhanced Diffusion (TED) - Simulation Examples, TED Calculations, RSCE in detail Video
  14. 16. The SUPREM IV Process Simulator Video
  15. 17. Thin Film Deposition and Epitaxy - Introduction to CVD, Si Epitaxial Growth Video
  16. 18. Thin Film Deposition and Epitaxy - CVD Examples and PVD Video
  17. 19. Thin Film Deposition and Epitaxy - Modeling Topography of Deposition Video
  18. 20. Etching - Introduction Video
  19. 21. Etching - Poly Gate Etching, Stringers, Modeling of Etching Video
  20. 22. Silicides, Device Contacts, Novel Gate Materials Video
  21. 23. Growth and Processing of Strained Si/SiGe and Stress Effects on Devices Video

Syllabus and materials

At MIT OpenCourseWare, as the course publishes them.

Credits and licence

Institution
Massachusetts Institute of Technology
Department
Electrical Engineering and Computer Science
Taught by
Prof. Judy Hoyt, Prof. L. Rafael Reif
Term
Fall 2004
Level
Graduate
Language
English
Subjects
Physics, Computer science, Engineering
Source
MIT OpenCourseWare
Licence
CC BY-NC-SA 4.0, as MIT OpenCourseWare states it. Non-commercial use only. MIT OpenCourseWare's terms
Attribution
Prof. Judy Hoyt, Prof. L. Rafael Reif. Physics of Microfabrication: Front End Processing. Fall 2004. Massachusetts Institute of Technology: MIT OpenCourseWare, https://ocw.mit.edu/. License: Creative Commons BY-NC-SA.
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