Lecture 18 of 60Week 4
Lecture-18 :Introduction to CVD Process
Prof. Samit K Ray · IIT Kharagpur
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- Thin Film Technology, IIT Kharagpur (at NPTEL)
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- CC BY-NC-SA, as NPTEL states it. Non-commercial use only.
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All the lectures
- Lecture -1 : General Introduction
- Lecture-2 : Thin Film Materials & Components
- Lecture-3 : Semiconductor Films & Heterostructures
- Lecture-4: Chemical Methods
- Lecture-5 : Physical Vapor Deposition (PVD) : Thermal Evaporation
- Lecture-6 : Thermal Evaporation
- Lecture-7 :Sources of Thermal Evaporation
- Lecture-8 : Evaporation of Elements & Compounds
- Lecture-9 : Compound Evaporation & Thickness Uniformity
- Lecture-10 : Film Thickness Monitoring & Control
- Lecture-11: Pulsed Laser Deposition
- Lecture-12: Sputtering Process & Mechanism
- Lecture-13 : Plasma Discharge and DC Sputtering
- Lecture-14 : RF Sputtering Process
- Lecture-15 : Magnetron Sputtering
- Lecture -16: Sputtering of Binary Alloys & Compounds
- Lecture-17 : Ion Beam and Hybrid Deposition
- Lecture-18 :Introduction to CVD Process
- Lecture -19 : Thermal CVD Process
- Lecture-20 : Gas Transport & Growth Kinetics
- Lecture -21 :CVD Processes and Systems
- Lecture-22 : Plasma Enhanced CVD (PECVD)
- Lecture-23 : Liquid Phase Epitaxy
- Lecture-24 : Vapor Phase Epitaxy - Compound Semiconductors
- Lecture-25 :Metal-Organic CVD (MOCVD)
- Lecture -26 : Introduction & Film Purity
- Lecture -27 : MBE System & Growth Mechanism
- Lecture -28 : Effusion Source & Growth Rate
- Lecture -29: Insitu Growth Monitoring - RHEED Oscillation
- Lecture -30 : Atomic Layer Deposition / Atomic Layer Epitaxy
- Lecture-31 : Thin Film Growth Modes
- Lecture -32 : Homogeneous Nucleation
- Lecture-33 : Heterogenous Nucleation
- Lecture-34 : Stranski-Krastanov (2D-3D) Growth Mode
- Lecture-35 : SiGe Strained Layer Epitaxy (2D) & Ge Islands (3D)
- Lecture -36 : Thickness Measurement
- Lecture - 37 : Thickness Measurement - Interference Method
- Lecture-38: Thickness & Optical Constants - Ellipsometry
- Lecture -39 : Mechanical Properties - Film Porosity & Adhesion
- Lecture -40 : Mechanical Properties – Residual Stress
- Lecture - 41: Electron Beam Techniques - SEM
- Lecture - 42 : Scanning Electron Microscopy
- Lecture-43 : Microprobe & Transmission Electron Microscopy
- Lecture - 44 : Transmission Electron Microscopy
- Lecture - 45 : Scanning Probe Microscopy
- Lecture - 46 : X-ray Photoelectron Spectroscopy
- Lecture - 47 : Auger Electron Spectroscopy
- Lecture - 48 : Secondary Ion Mass Spectrometry (SIMS)
- Lecture - 49 : Different SIMS Techniques & Depth Profile Analysis
- Lecture - 50 : Rutherford Backscattering Spectrometry (RBS)
- Lecture - 51 : Basic Device Fabrication Techniques
- Lecture - 52 : Metal-Oxide-Semiconductor (MOS) Capacitor
- Lecture - 53 : n-MOSFET & CMOS FET Devices
- Lecture - 54 : Scaled Si MOSFET Devices
- Lecture - 55 : Heterostructure FET and Bipolar Transistors
- Lecture - 56 : Optoelectronic Materials & Devices
- Lecture - 57 : Light Emitting Devices
- Lecture - 58 : Photodetector Devices
- Lecture - 59 : Photovoltaic Devices
- Lecture -60 : Nanotechnology & Photonic Devices