Learn · Basic Overview of Semiconductor Device Processing and IC Fabrication
Lecture 16 of 39Week 4
Lecture 16: Vacuum Systems - Part II
Prof. S. Sundar Kumar Iyer · IIT Kanpur
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- Basic Overview of Semiconductor Device Processing and IC Fabrication, IIT Kanpur (at NPTEL)
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All the lectures
- Lecture 1: General Introduction of Course
- Lecture 2: Historical Perspective on IC Technology
- Lecture 3: Scaling Trends in IC Fabrication
- Lecture 4: Moore's Law
- Lecture 5: Scaling of MOSFET
- Lecture 6: Enablers of VLSI Technology - Part I
- Lecture 7: Enablers of VLSI Technology - Part II
- Lecture 8: Some Background Information
- Lecture 9: Planar Processing of n+-p Diode
- Lecture 10: CMOS Processing - Masks Involved
- Lecture 11: CMOS Planar Processing - Part I
- Lecture 12: CMOS Planar Processing - Part II
- Lecture 13: A Glimpse of Advanced FET Structure Evolution
- Lecture 14: IC Packaging - Far Back End of Line
- Lecture 15: Vacuum Systems - Part I
- Lecture 16: Vacuum Systems - Part II
- Lecture 17: Plasma for Semiconductor Processing
- Lecture 18: Crystalline Substrates - Part I
- Lecture 19: Crystalline Substrates - Part II
- Lecture 20: Crystalline Silicon Substrates
- Lecture 21: Silicon on Insulator (SOI) Substrates
- Lecture 22: GaAs and Other Substrates
- Lecture 23: Oxidation of Silicon - Part I
- Lecture 24: Oxidation of Silicon - Part II
- Lecture 25: Thermal Nitridation of Silicon
- Lecture 26: Diffusion - Part I
- Lecture 27: Diffusion - Part II
- Lecture 28: Diffusion – Part III
- Lecture 29: Ion Implantation - Part I
- Lecture 30: Ion Implantation - Part II
- Lecture 31: Thin Film Process
- Lecture 32: Chemical Vapour Deposition (CVD) - Part I
- Lecture 33: Chemical Vapour Deposition (CVD) - Part II
- Lecture 34: Physical Vapour Deposition (PVD)
- Lecture 35: Lithography
- Lecture 36: Etch Process
- Lecture 37: Statistical Tools for Processing
- Lecture 38: Concluding Comments
- Lecture 39: Printing Process For Thin Films (Supplementary Lecture)