Learn · Fundamentals of Micro and Nanofabrication
Lecture 31 of 61Week 7: Optical Lithography 2
Optical Lithography: Contact and Proximity printing
Prof. Sushobhan Avasthi and Prof. Shankar Selvaraja · IISc Bangalore
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- Fundamentals of Micro and Nanofabrication, IISc Bangalore (at NPTEL)
- Licence
- CC BY-NC-SA, as NPTEL states it. Non-commercial use only.
- Attribution
- NPTEL states: "Distributed under Creative Commons Attribution-ShareAlike / CC BY - NC - SA", beside a BY-NC-SA badge.
- Who can watch
- Teens profiles and older. How courses are placed
All the lectures
- Introduction
- Substrate
- Substrate Contd
- Introduction to cleanroom
- Contamination and surface cleaning
- Advanced cleaning techniques
- Defects
- Diffusion
- Diffusion -- Advacned Concepts
- Ion Implantation
- Ion Implantation Contd
- Native Films
- Native Films: Advanced Concepts
- Native Films: Defects at Si/SiO2 interface
- Methods and Some Definitions
- Chemical Vapor Depostion: Basics
- Chemical Vapor Depostion: Precursor Transport
- Chemical Vapor Depostion: Types of CVD Equipment
- Chemical Vapor Depostion: Nucleation and Growth
- Chemical Vapor Depostion: Other Details
- Atomic Layer Depostion
- Atomic Layer Depostion Contd..
- Physical Vapor Deposition: Basics
- Physical Vapor Deposition: Evaporation
- Physical Vapor Deposition: Sputtering
- Metallization: Contact resistance
- Metallization: Electromigration and Epilogue
- Pattern Transfer Basics
- Optical lithography basics: resist process-1
- Optical lithography basics: resist process-2
- Optical Lithography: Contact and Proximity printing
- Optical Lithography: Stepper and Scanner
- Projection Lithography: Image formation basics
- Projection Lithography: Image formation in photoresist
- Optical lithography: Surface Reflection
- Optical Lithography: Mask Technology
- Lithography process technology glossary
- Optical Lithography: Resolution enhancement
- Electron beam lithography: Basics
- Electron beam lithography: Resist process
- Emerging lithography techniques
- Etching Figures of Merit
- Wet etching Basics
- Wet Ething Recipes
- Wet Ething Recipes
- Dry etch: Plasma Basics
- Dry etch: Plasma etching basics
- Dry etch: Plasma tool configuration
- Dry etch: Etch mechanism
- Dry etch: Etch chemistry
- Chemical Mechanical Polishing (CMP): Basics
- Chemical Mechanical Polishing (CMP): Tool and process
- Design for Manufacturability-1
- Design for Manufacturability-2
- Design for Manufacturability: Case study
- Process Integration
- PV Integration - 1
- PV Integration - 2
- Lab demo: Silicon Nitride cantilever fabrication-1
- Lab demo: Silicon Nitride cantilever fabrication-2
- CMOS process for photonics application